產(chǎn)品[
日本YAMATO等離子清洗機(jī)PR500/510
]資料
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產(chǎn)品名稱:
日本YAMATO等離子清洗機(jī)PR500/510
產(chǎn)品型號:
PR500/PR510
產(chǎn)品展商:
YAMATO
產(chǎn)品文檔:
無相關(guān)文檔
簡單介紹
日本YAMATO等離子清洗機(jī)PR500/510
小型等離子清洗機(jī)PR500/PR510,廣泛被應(yīng)用在半導(dǎo)體材料的灰化、蝕刻、干式清洗等方面,外形小巧,價(jià)格經(jīng)濟(jì)
日本YAMATO等離子清洗機(jī)PR500/510的詳細(xì)介紹
日本YAMATO等離子清洗機(jī)PR500/510:
Gas Plasma Etcher
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PR500/PR510
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Model
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500
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510
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Method
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Barrel type of DP
DP : direct plasma
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High-frequency Output
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Max.500W
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Oscillating Frequency
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13.56MHz
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Reaction Chamber
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?215×305mm
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The PR500/510 isagasplasma device that is used widely for such applicationsasproductionof semiconductors and analysis work. Itboastsoutstandingoperability and safety, with an automatic tuningsystemas a standardcomponent and other features.
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It has a compact design,withasmall-size HF generator and an oscillation sectionintegratedwitha portion of the chamber.
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With the 215mm diameterlargecaliberchamber, the unit can process bigtestingsamples.
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The gas plasmaequipment has a wide range ofapplications fromashing, etching,dry cleaning,etc.
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Operation Flowchart
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Piping System Diagram
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Specifications
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Model
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PR500
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PR510
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Method
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Barrel type of direct plasma
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Controlpart
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Highfrequency output
|
Max.500W
|
Oscillating frequency
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13.56MHz
|
Outputimpedance
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50Ω
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Tuningmethod
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Automatic tuning
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Instrument
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Output watt meter (0 to 600W)
Reflected wave watt meter (0 to 300W)
Vacuum gauge, thermocouple type
Flow meter, needle valve integrated type, 2 sets
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Timer
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0.1sec. to 999h
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Gasinlet
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1/4"stainless steel, 2 inlet
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Powersource (50/60Hz)
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AC100/220V, single phase, 2 kVA
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Reactionpart
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Reactionchamber
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Madeof quarts, φ215×305mm
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Electrodestructure
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Condenser type, 4-way split
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Controlsystem
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Autopressurereduction, auto leak valve
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TouchpanelwithPLC control
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Pipingmaterial
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SUS,Teflon
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Externaldimensions(W×D×Hmm)
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438×520×760
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520×630×760
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Weight
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Approx.38kg
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Approx.60kg
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StandardAccessories
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Connection cable :1completeset
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Vacuum grease : 1 pc.
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O-ring for reaction chamber:1pc.
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OptionalAccessories
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Frame for wafers, 2, 3,4,5, 6 inches Multipurposeangledframe
Aluminum etchingtunnelStand
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